发明名称 VACUUM-TREATING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a vacuum-treating device which can sufficiently secure the heat transfer between a placing base and a heating medium without bringing the medium into direct contact with the base. SOLUTION: This vacuum-treating device is provided with a constant- temperature member 3 having a constant-temperature surface 3a which is maintained in a constant-temperature state during the treatment of an object W to be treated in a treatment chamber 2. An electrostatic chuck device 5 which holds the object W in the chamber 2 has the placing base 4 which is set up in the chamber 2 to face the constant-temperature surface 3a, and an electrostatic chuck section 16 which is provided on the placing surface 4a of the base 4 and attracts and holds the object W with an electrostatic force. The vacuum-treating device is also provided with a heat-conductive sheet 30 which is interposed between the placing base 4 and constant-temperature member 3, has a surface 30a adhered closely to the base 4 and a rear surface 30b adhered closely to the member 3, and secures the heat transfer between the base 4 and member 3.</p>
申请公布号 JP2001237222(A) 申请公布日期 2001.08.31
申请号 JP20000044178 申请日期 2000.02.22
申请人 SHIBAURA MECHATRONICS CORP 发明人 TAKEISHI KOJI
分类号 H01L21/302;H01L21/3065;H01L21/68;H01L21/683;(IPC1-7):H01L21/306 主分类号 H01L21/302
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