发明名称 ELECTROPLATING JIG
摘要 PROBLEM TO BE SOLVED: To provide an electroplating jig with which the thickness of an electroplating layer is kept almost uniform. SOLUTION: A substrate 1 is held in a plating bath 2 and electroplated by this electroplating jig A. The jig is provided with a frame 3 for holding the substrate 1 and applying a current to the substrate 1 and a current applying auxiliary bypass 4 for electrically connecting plural parts of the frame 3. The current density is practically uniformized between an electroless plating layer and a circuit which are positioned at a part of the substrate 1 near a power source and an electroless plating layer and a circuit which are situated at a part far from the power source.
申请公布号 JP2001234397(A) 申请公布日期 2001.08.31
申请号 JP20000048119 申请日期 2000.02.24
申请人 MATSUSHITA ELECTRIC WORKS LTD 发明人 NISHIMOTO SHINYA;TAKAGI KOJI;MORIOKA KAZUNOBU;KANETANI DAISUKE
分类号 C25D17/08;(IPC1-7):C25D17/08 主分类号 C25D17/08
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