发明名称 |
ELECTROPLATING JIG |
摘要 |
PROBLEM TO BE SOLVED: To provide an electroplating jig with which the thickness of an electroplating layer is kept almost uniform. SOLUTION: A substrate 1 is held in a plating bath 2 and electroplated by this electroplating jig A. The jig is provided with a frame 3 for holding the substrate 1 and applying a current to the substrate 1 and a current applying auxiliary bypass 4 for electrically connecting plural parts of the frame 3. The current density is practically uniformized between an electroless plating layer and a circuit which are positioned at a part of the substrate 1 near a power source and an electroless plating layer and a circuit which are situated at a part far from the power source.
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申请公布号 |
JP2001234397(A) |
申请公布日期 |
2001.08.31 |
申请号 |
JP20000048119 |
申请日期 |
2000.02.24 |
申请人 |
MATSUSHITA ELECTRIC WORKS LTD |
发明人 |
NISHIMOTO SHINYA;TAKAGI KOJI;MORIOKA KAZUNOBU;KANETANI DAISUKE |
分类号 |
C25D17/08;(IPC1-7):C25D17/08 |
主分类号 |
C25D17/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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