| 发明名称 |
HIGH FREQUENCY PLASMA BEAM SOURCE |
| 摘要 |
The invention relates to a high frequency plasma source, comprising a suppor t element, on which a magnetic field coil arrangement (4), a gas distribution system (6) and a unit for extraction of a plasma beam are arranged. Additionally a high frequency matching network (2) is arranged within the plasma source.
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| 申请公布号 |
CA2401220(A1) |
申请公布日期 |
2001.08.30 |
| 申请号 |
CA20012401220 |
申请日期 |
2001.02.21 |
| 申请人 |
CCR GMBH BESCHICHTUNGSTECHNOLOGIE |
发明人 |
WEILER, MANFRED;DAHL, ROLAND |
| 分类号 |
H01J37/32;H01L21/205;H01L21/3065;H05H1/46;(IPC1-7):H05H1/46 |
主分类号 |
H01J37/32 |
| 代理机构 |
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