| 摘要 |
PURPOSE: To alleviate the absolute control accuracy of a phase in a mask having a groove shifter structure. CONSTITUTION: Transfer regions 4C, 4D formed on a different flat surface positions of the same surface of the same masks 2 are multiple exposed by scanning exposure. The same mask patterns are formed on the regions 4C, 4D, but the dispositions of shifters 2d are opposite each other. |
