发明名称 |
Electron beam irradiation of gases and light source using the same |
摘要 |
Excimers are generated by directing an electron beam at about 5 KeV to about 40 KeV into an excimer forming gas such as He, Ne, Ar, Kr, and Xe or mixtures of these with other gases through a ceramic foil such as SiNx. Vacuum ultraviolet (VUV) light is emitted by the excimers or by other species in contact therewith. The invention can provide intense, continuously operable broadband or monochromatic VUV light sources.
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申请公布号 |
US6282222(B1) |
申请公布日期 |
2001.08.28 |
申请号 |
US19990390062 |
申请日期 |
1999.09.03 |
申请人 |
RUTGERS, THE STATE UNIVERSITY |
发明人 |
WIESER JOCHEN;ULRICH ANDREAS;MURNICK DANIEL E.;KROETZ WERNER |
分类号 |
H01J61/16;H01J61/30;H01J65/04;H01S3/09;H01S3/225;(IPC1-7):H01S3/095 |
主分类号 |
H01J61/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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