发明名称 Substrate structure
摘要 A semiconductor substrate structure includes a conductor supported by a substrate, and has an outer surface and a pair of spaced-apart conductive sidewalls joining with the outer surface at respective corners. A first layer of material is disposed over the substrate over all of one of the sidewalls, over only a portion of the outer surface and over only a portion of the other sidewall. The first layer of material has a generally uniform thickness over the conductor outer surface, the conductive sidewalls and the corners. A second layer of material having a generally non-uniform thickness is disposed over the substrate. Such has a non-planar outer surface, and an opening therethrough to the conductor's outer surface and the other sidewall which do not have first layer material disposed thereover.
申请公布号 US6281447(B1) 申请公布日期 2001.08.28
申请号 US20000569446 申请日期 2000.05.12
申请人 MICRON TECHNOLOGY, INC. 发明人 MANNING H. MONTGOMERY
分类号 H01L21/311;H01L21/768;(IPC1-7):H05K1/03 主分类号 H01L21/311
代理机构 代理人
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