发明名称 |
Test structure for metal cmp process control |
摘要 |
A test structure is presented to be formed on a patterned structure and to be used for controlling a CMP process applied to the patterned structure, which has a pattern area formed by spaced-apart metal-containing regions representative of real features of the patterned structure. The test structure thus undergoes the same CMP processing as the pattern area. The test structure comprises at least one pattern zone in the form of a metal area with at least one region included in the metal area and made of a material relatively transparent with respect to incident light, as compared to that of the metal. |
申请公布号 |
AU3592701(A) |
申请公布日期 |
2001.08.27 |
申请号 |
AU20010035927 |
申请日期 |
2001.02.20 |
申请人 |
NOVA MEASURING INSTRUMENTS LTD. |
发明人 |
AVI RAVID;VLADIMIR MACHAVARIANI;AMIT WEINGARTEN;DAVID SCHEINER |
分类号 |
B24B37/04;B24B49/12;B24B49/14;H01L21/321;H01L23/544 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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