发明名称 FET FOR MILLIMETER WAVES AND MANUFACTURING METHOD THEREOF
摘要 PURPOSE: An FET for millimeter waves and a manufacturing method thereof are provided to have a ground effect even in frequency range of millimeter waves. CONSTITUTION: An active layer(23) is formed on a substrate(20) and has source and drain areas. Source, drain and gate electrodes are respectively formed on the source and drain areas and the active layer between the areas. A source metal pad(24) for electrically connecting the source is grounded through a via hole(26). A metal layer(25) is formed on both interior of the via hole and a rear surface of the substrate. A capacitor is serially connected to the via hole by etching the metal layer to separate it. It is preferable that the equivalent inductance due to the via hole and the capacitance of the capacitor are preset to generate serial resonance.
申请公布号 KR100308041(B1) 申请公布日期 2001.08.27
申请号 KR19980006588 申请日期 1998.02.28
申请人 LG ELECTRONICS INC. 发明人 KIM, DONG UK
分类号 H01L29/76;(IPC1-7):H01L29/76 主分类号 H01L29/76
代理机构 代理人
主权项
地址
您可能感兴趣的专利