MASK BLANK FOR PHASE SHIFT MASK OF SUBSTRATE MORTISE TYPE, PHASE SHIFT MASK OF SUBSTRATE MORTISE TYPE AND METHOD FOR MANUFACTURING PHASE SHIFT MASK OF SUBSTRATE MORTISE TYPE

摘要

PROBLEM TO BE SOLVED: To provide a substrate mortise type phase shift mask having high substrate mortise accuracy and a method for manufacturing the same and simultaneously to provide a blank for the substrate mortise type phase shift mask for manufacturing the substrate mortise type phase shift mask having the high substrate mortise accuracy. SOLUTION: The method for manufacturing the phase shift mask of the substrate mortise type which forms a mortise part by subjecting a transparent substrate to mortising while measuring and monitoring the displacement quantity from the non- etching surface of a surface to be etched from the rear surface side facing the front surface on the side provided with the mortise of the transparent substrate by a contactless reflection type displacement quantity measuring instrument using light of a prescribed measurement wavelength consists in previously disposing an antireflection film for preventing the reflection of the light of the prescribed measurement wavelength described above on the rear surface of opposite to the front surface of the transparent substrate on the side to be provided with the mortise when making the measurement and monitor and removing the noise component by the reflected light from the rear surface.