| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a shot map capable of further improving the throughput. SOLUTION: Chip patterns 52a to 52d having a monitoring chip 52a and product chips 52b to 52d are formed on a shot region 50. The chip 52a is disposed at a position farthest from the center S of a plurality of shot regions 50. An array of the plurality of the regions 50 is decided so that the number of the chips 52b to 52d disposed in an effective exposure region 34 on a wafer 12 becomes the maximum. |
