| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a thin film magnetic head for controlling the dimension of the width of a magnetic pole and shortening the time required for forming it. SOLUTION: After an upper pole chip precursory layer 112a consisting of iron nitride is formed by sputtering, the surface of the upper pole chip precursory layer 112a is polished to be flattened. A first mask precursory layer 122a and a photoresist film are successively formed on the flattened upper pole chip precursory layer 112a. A photoresist pattern 132a having an opening part 132x is formed by selectively exposing the photoresist film for patterning in a photolithography process. Since the surface of the first mask precursory layer 122a which is formed as the upper layer on the upper pole chip precursory layer 112a is also flattened by polishing the surface of the upper pole chip precursory layer 112a to flatten the surface, the breakage of the pattern due to the reflected light from a ground at the time of exposure can be suppressed and the opening part 132x of the photoresist pattern 132a can be formed with high accuracy. |
