| 摘要 |
PROBLEM TO BE SOLVED: To obtain a wave front aberration measuring method and a projection aligner which can measure precisely the wave front aberration at a high speed for grasping imagery performance of a projection optical system which is changed by an exposing load and environmental change in the projection aligner. SOLUTION: In a wave front measuring method of a projection optical system of a projection aligner wherein a pattern formed on a first object is image- formed on a second object via the projection optical system and exposed to a light, an optical intensity detecting means for measuring optical intensity distribution of a specified pattern on a surface of the first object via the projection optical system, a wave front aberration operating means for the calculating wave front aberration of the projection optical system by using the optical intensity distribution detected by the optical intensity detecting means, and a control means which measures the wave front aberration of the projection optical system in the case that the exposing load and/or the environmental change or the like are measured and these values exceed constant values, are used.
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