A test structure is presented to be formed on a patterned structure and to be used for controlling a CMP process applied to the patterned structure, which has a pattern area formed by spaced-apart metal-containing regions representative of real features of the patterned structure. The test structure thus undergoes the same CMP processing as the pattern area. The test structure comprises at least one pattern zone in the form of a metal area with at least one region included in the metal area and made of a material relatively transparent with respect to incident light, as compared to that of the metal.
申请公布号
WO0161746(A2)
申请公布日期
2001.08.23
申请号
WO2001IL00159
申请日期
2001.02.20
申请人
NOVA MEASURING INSTRUMENTS LTD.;RAVID, AVI;MACHAVARIANI, VLADIMIR;WEINGARTEN, AMIT;SCHEINER, DAVID
发明人
RAVID, AVI;MACHAVARIANI, VLADIMIR;WEINGARTEN, AMIT;SCHEINER, DAVID