发明名称 |
BALLAST LAYER FOR FIELD EMISSION DEVICE |
摘要 |
PURPOSE: A ballast layer for field emission device is provided to meet the resistance condition at the temperature range used. CONSTITUTION: A ballast layer for field emission device consists of a very thin layer of heavily doped nano-crystalline silicon and a layer of one or more properly doped amorphous silicon based material. The doped nano-crystalline silicon has thickness of 10-100nm. The layer of one or more properly doped amorphous silicon based material has total thickness in excess of 4 times thickness of the doped nano-crystalline silicon.
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申请公布号 |
KR20010078202(A) |
申请公布日期 |
2001.08.20 |
申请号 |
KR20010004545 |
申请日期 |
2001.01.31 |
申请人 |
UNAXIS BALZERS LIMITED |
发明人 |
LEBLANC FRANCOIS;PHAM HANH;SCHMITT JACQUES;TURLOT EMMANUEL |
分类号 |
H01J29/04;H01J1/30;H01J1/304;H01J31/12;(IPC1-7):H01J1/30 |
主分类号 |
H01J29/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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