| 摘要 |
PURPOSE: A scanning exposure method, its apparatus and a method for preparing a device by using the exposure apparatus are provided, to improve the roughness uniformity of a photosensitive substrate by measuring the width of the scanning direction corresponding to the slit-shaped irradiation region on the substrate. CONSTITUTION: The scanning exposure method comprises the step of moving a body to be irradiated to an exposure beam, wherein the information about the edge position of the moving direction of the body to be irradiated, of the exposure region of the exposure beam at the face of the body to be irradiated is measured, and the exposure light amount control parameters are determined for the scanning exposure based on the measured result. Optionally the shape of the exposure region and/or the wide of the moving direction of the body to be irradiated are measured instead of the information about the edge position of the moving direction of the body to be irradiated, of the exposure region of the exposure beam.
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