发明名称 GAS-FILLED PARTICLE ACCELERATOR WITH A PULSED PLASMA SOURCE
摘要 <p>A gas-filled particle accelerator comprising a pulsed plasma source with a coaxial electrode arrangement. The front face of the electrode arrangement protrudes into the hollow cathode chamber at a low erosion point i.e. the rear area of the hollow cathode. Sliding discharge begins on the front face via a low-erosion ceramic, whereby the exposed surface thereof is covered with an eroding sliding discharge agent. Discharge is then transferred by inductive decoupling to an emission ring with an emission edge, thus becoming the main discharge source for the particle accelerator. A high voltage source supplies both the trigger circuit and the load current circuit. Said structure provides a long-life, industrially useful plasma source.</p>
申请公布号 EP1123641(A1) 申请公布日期 2001.08.16
申请号 EP19990952541 申请日期 1999.10.08
申请人 FORSCHUNGSZENTRUM KARLSRUHE GMBH 发明人 SOEHNER, MICHAEL;FREY, WOLFGANG;SCHULTHEISS, CHRISTOPH
分类号 H01J27/08;H01T2/02;H05H1/24;(IPC1-7):H05H1/24 主分类号 H01J27/08
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