发明名称 |
Method to remove metals in a scrubber |
摘要 |
A method to remove metal contaminants in a substrate cleaning process. The present invention may replace or be used in conjunction with other substrate cleaning systems. This method comprises adding a citric acid solution to the liquid medium of a semiconductor substrate cleaning system. This method is described in the manner it is used in conjunction with a scrubber wherein both sides of a wafer are scrubbed.
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申请公布号 |
US6274059(B1) |
申请公布日期 |
2001.08.14 |
申请号 |
US19960615520 |
申请日期 |
1996.03.11 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
KRUSELL WILBUR C.;MALIK IGOR J. |
分类号 |
B08B1/04;B08B3/08;H01L21/304;H01L21/306;H01L21/308;(IPC1-7):B44C1/22 |
主分类号 |
B08B1/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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