发明名称 Evaporation apparatus
摘要 An inactive gas is introduced into an organic material evaporation source to place a thin organic film material in the organic material evaporation source in an atmosphere having a relatively high pressure, and the temperature of the thin organic film material is increased up to a certain temperature. Then, the organic material evaporation source is evacuated to lower the pressure around the thin organic film material for thereby causing the thin organic film material to emit a vapor. Since no wasteful vapor is emitted from the thin organic film material, the thin organic film material is effectively utilized. Because the inactive gas acts as a heating medium, the temperature of the thin organic film material is increased at a high rate, and the thin organic film material is uniformly heated. When the temperature of the thin organic film material is lowered in an inactive gas atmosphere, it can be lowered at a high rate. The inactive gas is introduced directly into the organic material evaporation source by an on-off valve, the time required to evacuate the organic material evaporation source is reduced. A liquid thin organic film material may be heated by a heating medium in the organic material evaporation source, so that the liquid thin organic film material will not be heated to a temperature higher than the temperature of the heating medium, and hence will not suffer bumping due to a temperature overshooting.
申请公布号 US6275649(B1) 申请公布日期 2001.08.14
申请号 US20000478911 申请日期 2000.01.07
申请人 NIHON SHINKU GIJUTSU KABUSHIKI KAISHA 发明人 NAGASHIMA NAOKI;TAKAHASHI NATSUKI;NEGISHI TOSHIO
分类号 C23C14/12;C23C14/24;C23C14/54;(IPC1-7):A01G13/06;C10K15/00 主分类号 C23C14/12
代理机构 代理人
主权项
地址