发明名称 CONTINUOUS MANUFACTURING METHOD AND CONTINUOUS MANUFACTURING DEVICE OF SILICON OXIDE POWDER
摘要 PROBLEM TO BE SOLVED: To provide a method and device for manufacturing silicon oxide power by which amorphous silicon oxide powder of high purity can be continuously and stably manufactured and consequently silicon oxide of low price can be supplied to a market. SOLUTION: The continuous manufacturing method of the silicon oxide powder is distinguished by that a raw material powdery mixture containing the silicon dioxide powder is supplied into a reaction furnace and then is heated in an inert gas or under reduced pressure at 1,100 to 1,600 deg.C in this reaction furnace to generate gaseous silicon oxide, the gaseous silicon oxide is introduced in a cooling chamber through a transportation tube held at >=1,000 deg.C to <=1,300 deg.C to be deposited on a cooled substrate surface and then silicon oxide deposit is continuously recovered.
申请公布号 JP2001220123(A) 申请公布日期 2001.08.14
申请号 JP20000027582 申请日期 2000.02.04
申请人 SHIN ETSU CHEM CO LTD 发明人 FUKUOKA HIROFUMI;UENO SUSUMU;FUKUDA TAKESHI
分类号 C01B33/113;C09C1/00;H01M4/48;H01M4/485;H01M10/0525;H01M10/36 主分类号 C01B33/113
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