| 摘要 |
PROBLEM TO BE SOLVED: To enhance the adhesion of a photoresist film to a substrate. SOLUTION: The surface treating agent for a resist pattern which is applied to a substrate before the formation of the resist pattern on the substrate so as to enhance the adhesion of the resist pattern to the substrate contains one or more compounds of the formula R1R2a(OX)bSiO(3-a-b)/2 (where R1 is -(CH2)nY; Y is epoyxcyclohexyl, glycidoxy, N-β-aminoethylamino, amino, N-phenylamino, mercapto or isocyanato; (n) is an integer of 0-4; R2 is a 1-4C monovalent hydrocarbon group; X is H or a 1-4C monovalent hydrocarbon group; (a) is 0 or 1, in the case of a=0, (b) is 0, 1 or 2, and in the case of a=1, (b) is 0 or 1). |
