发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 <p>PROBLEM TO BE SOLVED: To provide a semiconductor device together with its manufacturing method wherein no distortion or poor connection takes place under heat or external force, resulting in good yield of products. SOLUTION: A through hole 9 which connects a wiring part 5 to an electrode 6 through a bas material 1 and an adhesive layer 3 is provided on the base material side. The through hole 9 is filled with a conductive material 10 so that the wiring part 5 on the base material 1 is connected to the electrode 6 on a semiconductor chip 2. Thus, no operation such as soldering which requires a high-temperature atmosphere and a strong pressurizing force is required for a manufacturing process. So dimensional change or displacement under thermal expansion, or, distortion or damage such as deformation under pressurizing force is prevented, resulting in a high-quality semiconductor device at an efficient yield.</p>
申请公布号 JP2001217344(A) 申请公布日期 2001.08.10
申请号 JP20000027079 申请日期 2000.02.04
申请人 NEC CORP 发明人 SHIBAZAKI SHUICHI
分类号 H05K3/40;H01L21/3205;H01L21/60;H01L21/768;H01L23/12;H01L23/52;H01L23/522;H05K3/34;(IPC1-7):H01L23/12;H01L21/320 主分类号 H05K3/40
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