发明名称 METHOD AND DEVICE FOR TREATMENT BY USING TREATING LIQUID AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method and device for treatment by using treating liquids by which the problems raised by the supply of a wrong treating liquid can be prevented surely, and appropriately exchanging one treating liquid with another at the time of performing treatment by using the treating liquids, and, in addition, management can be performed by utilizing the data about the exchange of the treating liquids, and a method of manufacturing semiconductor device. SOLUTION: In this method of treating a work (semiconductor wafer, etc.), by using two or more kinds of treating liquids 1 and 2, (1) the suitability of an exchange liquids is decided by recognizing identification codes 21 and 22, such as bar codes, which identify treating solutions and comparing the codes 21 and 22 with registered data. In addition, the treating liquids are managed based on the history obtained at the time of recognizing the identification codes 21 and 22. (2) A device for treatment is at least provided with recognizing means 31 and 32 which recognize the codes 21 and 22, a decision means 6 which decides the suitability of the exchanged treating liquid by comparing the recognized codes with the registered data, and a history storing means which stores the history obtained at the time of recognizing the identification codes. A method of manufacturing semiconductor device uses the method and device of (1).
申请公布号 JP2001217217(A) 申请公布日期 2001.08.10
申请号 JP20000023746 申请日期 2000.02.01
申请人 SONY CORP 发明人 YOKOYAMA YOSHIHARU
分类号 G06K7/00;H01L21/304;H01L21/306 主分类号 G06K7/00
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