发明名称 RADIATION SENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent in basic physical resist properties such as sensitivity and resolution and showing only a small sensitivity change due to long-term storage. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble acid dissociable group-containing resin having a 3-30C alicyclic skeleton substituted by a group of formula 1 [where R1 is a group of formula 2 (where R2 and R3 are each a 1-4C alkyl or combine to each other to form a 3- to 8-membered cyclic structure) or formula 3 (where R4 is a 1-4C alkyl)] and convertible to an alkali-soluble resin when the acid dissociable group is dissociated and (B) a radiation sensitive acid generating agent.
申请公布号 JP2001215708(A) 申请公布日期 2001.08.10
申请号 JP20000028442 申请日期 2000.02.04
申请人 JSR CORP 发明人 DOUKI KATSUJI;MIYAMATSU TAKASHI;SOYANO AKIMASA;KAJITA TORU;SHIMOKAWA TSUTOMU
分类号 G03F7/039;G03F7/004 主分类号 G03F7/039
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