发明名称 |
RADIATION SENSITIVE RESIN COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent in basic physical resist properties such as sensitivity and resolution and showing only a small sensitivity change due to long-term storage. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble acid dissociable group-containing resin having a 3-30C alicyclic skeleton substituted by a group of formula 1 [where R1 is a group of formula 2 (where R2 and R3 are each a 1-4C alkyl or combine to each other to form a 3- to 8-membered cyclic structure) or formula 3 (where R4 is a 1-4C alkyl)] and convertible to an alkali-soluble resin when the acid dissociable group is dissociated and (B) a radiation sensitive acid generating agent. |
申请公布号 |
JP2001215708(A) |
申请公布日期 |
2001.08.10 |
申请号 |
JP20000028442 |
申请日期 |
2000.02.04 |
申请人 |
JSR CORP |
发明人 |
DOUKI KATSUJI;MIYAMATSU TAKASHI;SOYANO AKIMASA;KAJITA TORU;SHIMOKAWA TSUTOMU |
分类号 |
G03F7/039;G03F7/004 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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