Wafer rack provided with a gas distribution device

摘要

Wafer rack consisting of a carrier frame provided with accommodations for at least two wafers. To provide uniform distribution of gas over said wafers a gas distribution device is fitted at least above each wafer, which gas distribution device is connected to the gas supply for the reactor in which the wafer rack is placed. Connection to such a gas supply can be via coupling of the wafer rack to a part of said reactor.