SCANNING EXPOSURE APPARATUS, PREPARATION METHOD OF DEVICE USING THE APPARATUS AND SCANNING EXPOSURE METHOD

摘要

PURPOSE: A scanning exposure apparatus, its method and a method for preparing a device by using the exposure apparatus are provided, to allow the exposed surface of a photosensitive substrate to be put in high precision and high speed to the reference surface by focusing and leveling of high precision. CONSTITUTION: The scanning exposure apparatus exposes a second body by moving a second body to the exposure beam passed through a projection system with the synchronized moving of a first body to an exposure beam; comprises a measuring means which has a plurality of measuring marks measuring the position information of the second body to the optical axis direction of the projection system during the movement of the second body and an adjusting means which adjusts the position relation between the upper face of the projection system and the second body based on the measured result. The measuring mark used to adjust the position relation between the upper face of the projection system and the second body among a plurality of measuring marks is changed according to the moving direction of the second body.