| 摘要 |
PROBLEM TO BE SOLVED: To provide an antireflection film having high light absorptive powder and low reflectance and suitable for use in a photoresist process and a coating fluid capable of easily forming the antireflection film. SOLUTION: The antireflection film is obtained by dispersing carbon black having such particle aggregating properties as 20-50 nm Stokes mode diameter Dst of aggregates and <=40 nm half-width ΔDst of the diameter in a resin. Preferably the average particle diameter Dupa 50% of agglomerates is 20-150 nm and the maximum particle diameter Dupa 99% is <=300 nm. The coating fluid has a composition consisting of 1-20 wt.% carbon black having those particle aggregating properties, 2-10 wt.% resin and the balance solvent. |
