| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning gas system for reducing supplying volume for cleaning gas, in a lithography projection system. SOLUTION: A lithography projection system surrounds at least either of a masking holder or a base plate holder closely and comprises at least one of partitions, which do not surround either a illuminating system or a projection system in order for reduce a transparent gas volume, with which the system must be cleaned for projected radiation. In a scanner, the partition surrounding the masking holder preferably moves along with a masking table, and may be formed as a combination of a framed masking table driven by scanning operation, and a fixed stationary plate to the projection system and the lighting system.
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