发明名称 PROCESS FOR PRODUCING BUS-BAR FOR ELECTRIC ION PLATING
摘要 PURPOSE: Provided is a process for producing a bus-bar for electric ion plating, which improves contact force between copper and titanium, therefore, lifetime is extended and the thickness of plating is equalized by controlling the amount of added anode. CONSTITUTION: The process comprises the steps of: a first step(S1) for draw-molding a titanium pipe(1); a second step(S2) for heating and extruding the copper(2) and inserting the copper(2) in the titanium pipe(1); a third step(S3) for rolling the copper(2) inserted titanium pipe(1) by using compressing rollers; a forth step(S4) for bending the titanium pipe(1).
申请公布号 KR20010073752(A) 申请公布日期 2001.08.03
申请号 KR20000002585 申请日期 2000.01.20
申请人 TSMTECH CO., LTD. 发明人 MA, DAE YEOL
分类号 C25D3/00;(IPC1-7):C25D3/00 主分类号 C25D3/00
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