发明名称 |
SCHOTTKY BARRIER DIODE AND METHOD THEREOF |
摘要 |
PURPOSE: A schottky barrier diode and a method thereof are provided to decrease the voltage drop of the forward bias and not to degrade the characteristic of the reverse break down voltage without enlarging the size by forming a trench in an epitaxial layer. CONSTITUTION: An n-type epitaxial layer(20) is formed on a substrate(10). A trench and a p-type guard ring(30) are formed in the epitaxial layer(20). An insulating layer(40) having an opening is formed on the epitaxial layer(20), and a portion of the guard ring(30) is exposed by the opening. A barrier metal layer(50) is connected with the guard ring(30) and the epitaxial layer(20) through the opening. An anode electrode(60) is formed on the lower side of the substrate(10).
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申请公布号 |
KR20010073273(A) |
申请公布日期 |
2001.08.01 |
申请号 |
KR20000001523 |
申请日期 |
2000.01.13 |
申请人 |
FAIRCHILD KOREA SEMICONDUCTOR LTD. |
发明人 |
LEE, SANG HYEON |
分类号 |
H01L29/872;(IPC1-7):H01L29/872 |
主分类号 |
H01L29/872 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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