APERTURE STOP USED IN EXPOSURE APPARATUS FOR EXPOSING PHOTOSENSITIVE SUBSTRATE

摘要

PURPOSE: An aperture stop used in an exposure apparatus for exposing a photosensitive substrate is provided to response various design rules by having at least one opening and adjusting the distance from the center of the aperture stop to the opening. CONSTITUTION: The light(L1) passed through an aperture stop(21) is converted to parallel luminous flux by an output lens(31), and inputted to a relay lens(33) via a field stop(32). The light(L1) converges in a plane surface via the relay lens(33). The light(L1) is inputted in a condenser lens(35). The condenser lens(35) makes the light(L1) parallel, and the parallel light luminous flux illuminates a reticle(R) via the third mirror(36). When the light(L1) passes through the pattern plane surface of the reticle(R), the image of a reticle pattern(PA) is formed. The image of the reticle pattern is condensed on a pupil plane(P2), and projected in the resist film of a wafer placed on a wafer stage(5).