| 摘要 |
PROBLEM TO BE SOLVED: To suitably follow fine inclination fluctuation, stably retain a wafer retainer board, and improve the polishing accuracy of the wafer. SOLUTION: A retainer part 10 for retaining the wafer 12 is provided with a head member 20 provided with a recess 21, a wafer retainer board 22 arranged inside the recess 21 and having a retainer face 22a for retaining the wafer, a lower elastic suspension member 24 arranged across the head member 20 and the wafer retainer board 22a by being fixed to the both and positioned on the lower side near the retainer face 22a, an upper elastic suspension member 26 arranged across the head member 20 and the wafer retainer board 2 by being fixed to the both, and positioned on the upper side of the lower elastic suspension member 24, a wafer pressurizing pressure chamber 28 partitioned, at least, one of the lower elastic suspension member 24 or the upper elastic suspension member 26 and formed by sealing, and a pressurizing means 30 for feeding the pressure fluid to the wafer pressurizing pressure chamber 28. |
