| 摘要 |
In a slit scan type projection exposure apparatus, a predetermined number of pulsed lights are emitted from a pulsed light source to transfer a pattern on a reticle to a wafer while the reticle and the wafer are scanned at a constant speed with respect to an exposure area on the wafer. At that time, not only fluctuations of the energies of the pulsed lights but also fluctuations of light emission timing of the pulsed lights are taken into consideration.
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