| 摘要 |
PROBLEM TO BE SOLVED: To provide the apparatus and method, capable of efficiently and in a short time adsorbing even a contaminant low in vapor pressure on the surface of a substrate, in accurate adsorption quantity. SOLUTION: A hermetically closed container 1, of which the inner wall is constituted of a metal material, a heating means 2 having a temperature control function provided in the hermetically sealed container 1 and a substrate- holding device 3 for holding a substrate W in the hermetically sealed container 1 are provided. The heating means 2 heats the contaminant S in a metal tray 4 placed on the heating means 2 and the substrate-holding device 3 holds the substrate W, so as to oppose the surface to be contaminated thereof to the metal tray 4. When a prescribed quantity of contamination sample is fabricated, the contaminant S is heated to a prescribed temperature, in such a state that a prescribed amount of the contaminant S and the substrate W are hermetically sealed in the hermetically sealed container 1, and the substrate W is held on the hermetically sealed container 1 for a prescribed exposure time in this state.
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