| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an aligner which can realize high throughput and accurate exposure. SOLUTION: Tables TB1 and TB2 can be transferred by transfer systems 80A and 80B. The tables TB1 and TB2 can be supported, so that they can freely be attached/detached to/from the stage main bodies ST1 and ST2 without making contact and the tables can be driven with respect to the stage main bodies in a supported state. While a wafer on the table supported on the stage main body ST1 is exposed via a projection optical system PL, a wafer on the other table is aligned by an alignment system ALG. When exposure is terminated, the table holding the exposed wafer is transferred from the stage main body ST1 by the transfer system. The table holding the wafer after alignment is carried onto the stage main body ST1, and the exposure of the wafer is started immediately. The stage main bodies ST1 and ST2 are installed on different bases, and they do not mutually causes vibrations.</p> |
