| 摘要 |
PURPOSE: An interferometric alignment system for use in vacuum-based lithographic apparatus is provided to manufacture a device, such as an IC in a vacuum condition, and measure the position of an object in vacuum with high accuracy, e.g. for use in a lithographic projection apparatus. CONSTITUTION: The lithographic projection apparatus includes an illumination system(LA,IL) for supplying a projection beam of radiation; patterning means for patterning the projection beam according to a desired pattern; a substrate table(WT) for holding a substrate; and a projection system(PL) for imaging the patterned beam onto a target portion of the substrate. Here, a vacuum chamber(VC) in which at least one of the patterning means and the substrate table is contained; and an alignment system constructed and arranged to align the patterning means and a substrate on the substrate table, the alignment system comprising a passive part contained in the vacuum chamber and an active part outside the vacuum chamber.
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