| 摘要 |
PROBLEM TO BE SOLVED: To provide a film washing technique for removing fine foreign matters attached to the surface of a film, in particular, the foreign matters flattened by heating, pressing or the like. SOLUTION: While the film is conveyed, surface treatment using liquid containing aζ-potential control substance is subjected to a surface treatment part, thereafter, brush is washed in a washing part and dried in a drying part. On the surface treatment part, an electrostatic repulsion force is strengthened by using a substance for enlarging the absolute value of theζ-potential and the stripping of the foreign matters from the film is facilitated. On the washing part, the brush is washed with pure water, thereby, the frictional force between the brush and the foreign matters increases and the foreign matters are removed from the film. COPYRIGHT: (C)2011,JPO&INPIT
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