| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition method for producing compact optical parts and a system therefor. SOLUTION: The film deposition system, where substrates 4 are placed at an internal cylindrical body 12 rotatably centering around a longitudinal rotating shaft 10 and a plurality of target units, in each of which a couple of targets 2A and 2B (2B is under 2A) are disposed longitudinally in tandem inside an external cylindrical body 13 facing the surface 4a of the substrate 4, are arranged in parallel in a circumferential direction of the inner wall of the external cylindrical body 13, can be used. A backing plate 14 and a magnetron magnet 15 are disposed on the rear side of the targets 2a and 2b. Because a film can be deposited on the surface of the substrate by means of sputtering using glow discharge by impressing voltage while alternately reversing the polarities of the respective targets 2A and 2B, the execution of sputtering together with charge neutralization can be carried out using a small-sized, space-saving system of inline type, belljar type, etc.
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