发明名称 |
METHOD FOR FORMING SOLDER BUMP IMPROVING UBM UNDERCUT |
摘要 |
<p>PURPOSE: A method for forming a solder bump improving UBM(Under Bump Metallurgy) undercut is provided to improve the reliability of a bump by maximizing a contact area between a UBM and a solder bump or a UBM and a buffer layer. CONSTITUTION: A UBM(38a,38b) is formed on a semiconductor chip(30) and a chip pad(32). A photoresist pattern is formed on the UBM(38a,38b). A solder bump(40) is formed on the UBM(38a,38b) exposed through the photoresist pattern. The photoresist pattern is removed. An intermetallic compound layer(44) is formed on a boundary between the solder bump(40) and the UBM(38a,38b) by heating the solder bump(40). The UBM(38a,38b) is etched by using the intermetallic compound layer(44) as a mask. A reflow process for the solder bump(40) is performed.</p> |
申请公布号 |
KR20010068233(A) |
申请公布日期 |
2001.07.23 |
申请号 |
KR20000000042 |
申请日期 |
2000.01.03 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, BYEONG SU;LEE, CHANG HUN |
分类号 |
H01L21/60;H01L23/485;(IPC1-7):H01L21/60 |
主分类号 |
H01L21/60 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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