发明名称 METHOD FOR FORMING SOLDER BUMP IMPROVING UBM UNDERCUT
摘要 <p>PURPOSE: A method for forming a solder bump improving UBM(Under Bump Metallurgy) undercut is provided to improve the reliability of a bump by maximizing a contact area between a UBM and a solder bump or a UBM and a buffer layer. CONSTITUTION: A UBM(38a,38b) is formed on a semiconductor chip(30) and a chip pad(32). A photoresist pattern is formed on the UBM(38a,38b). A solder bump(40) is formed on the UBM(38a,38b) exposed through the photoresist pattern. The photoresist pattern is removed. An intermetallic compound layer(44) is formed on a boundary between the solder bump(40) and the UBM(38a,38b) by heating the solder bump(40). The UBM(38a,38b) is etched by using the intermetallic compound layer(44) as a mask. A reflow process for the solder bump(40) is performed.</p>
申请公布号 KR20010068233(A) 申请公布日期 2001.07.23
申请号 KR20000000042 申请日期 2000.01.03
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, BYEONG SU;LEE, CHANG HUN
分类号 H01L21/60;H01L23/485;(IPC1-7):H01L21/60 主分类号 H01L21/60
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