发明名称 DIELECTRIC THICK FILM FOR INORGANIC EL AND INORGANIC EL ELEMENT
摘要 PROBLEM TO BE SOLVED: To offer a dielectric thick film for an inorganic EL which can grow into a large area at low cost without using expensive substrates such as quartz, and further has a high reactivity not containing detrimental lead, and to provide an inorganic EL element. SOLUTION: The dielectric thick film for an inorganic EL formed on the substrate, comprises a dielectric material which has two or more phase change points between room temperature and thick-film formation temperature. An inorganic EL element using this film is also provided.
申请公布号 JP2001196185(A) 申请公布日期 2001.07.19
申请号 JP20000006815 申请日期 2000.01.14
申请人 TDK CORP 发明人 YANO YOSHIHIKO
分类号 H05B33/22;H05B33/12;(IPC1-7):H05B33/22 主分类号 H05B33/22
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