发明名称 ELECTRON BEAM IRRADIATION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an electron beam irradiation apparatus that can ensure uniform energy of an electron beam to be applied to an object to be treated, even if the energy of the electron beam is enhanced. SOLUTION: In this electron beam irradiation apparatus, which includes electron beam tubes 1 with linear window parts 2 for the emission of electron beams, the electron beam tubes 1 are arranged, so that the longitudinal directions of the window parts 2 can be approximately in parallel with each other, and the longitudinal direction of each of the window parts 2 can be approximately orthogonal to the direction of the movement of an object 12 to be treated. The electron beam irradiation apparatus is characterized by providing adjustment means 4, 5, 6, 7, 8, 9, 10 and 11, that adjust the degree of the overlap of the electron beams emitted from an adjacent electron beam tube 21.
申请公布号 JP2001194500(A) 申请公布日期 2001.07.19
申请号 JP20000001058 申请日期 2000.01.06
申请人 USHIO INC 发明人 YAMAGUCHI MASANORI
分类号 G21K5/04;(IPC1-7):G21K5/04 主分类号 G21K5/04
代理机构 代理人
主权项
地址
您可能感兴趣的专利