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发明名称
Umsetzung von hochsiedenden Rückständen der Direktsynthese in Monosilane
摘要
申请公布号
DE69705162(D1)
申请公布日期
2001.07.19
申请号
DE19976005162
申请日期
1997.05.22
申请人
DOW CORNING CORP., MIDLAND
发明人
FREEBURNE, STEVEN KERRY;JARVIS, JR.
分类号
C01B33/107;C07F7/12;C07F7/16;(IPC1-7):C07F7/12
主分类号
C01B33/107
代理机构
代理人
主权项
地址
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