| 摘要 |
PROBLEM TO BE SOLVED: To prevent the inside of charged particle application equipment from being contaminated in a wide range with flakes that are generated, when a thin film irradiated with a charged particle beam is crushed. SOLUTION: A cylindrical electrode 8 for capturing flakes that surrounds a path of a charged particle beam B in the condition, where a holder 6 holding a thin film 7 is located inside the electrode 8, is arranged in a vacuum chamber 2 in the condition, with the electrode 8 being insulated from the vacuum chamber 2 and the holder 6. A voltage is applied between the holder 6 and the electrode 8 from a power source 13 for applying a voltage, to capture flakes to produce potential difference between the holder 6 and the electrode 8. The thin film 7 and the electrode 8 are charged, so as to impart different polarities to them by forming a condenser out of the electrode 8 for capturing flakes and the holder 6. Flakes are captured by charging the flakes generated in the crush of the thin film 7 and allowing the electrode 8 to adsorb them, thereby preventing them from going to the outside the electrode 8.
|
