SPUTTERING TARGET FOR DEPOSITING OPTICAL RECORDING PROTECTIVE FILM CAPABLE OF DIRECT CURRENT SPUTTERING

摘要

PROBLEM TO BE SOLVED: To provide a sputtering target for depositing an optical recording protective film capable of d.c. sputtering. SOLUTION: This target has a composition containing silicon dioxide of 10 to 30 mol%, one or two kinds of indium-tin multiple oxide and antimony-tin multiple oxide by 5 to 35 mol% in total, and the balance zinc chalcogenide.