发明名称 SURFACE TREATMENT SYSTEM, SURFACE TREATMENT METHOD, AND SURFACE TREATED ARTICLE
摘要 PROBLEM TO BE SOLVED: To provide a surface treatment system capable of applying surface treatment by injecting ions by the plasma injection method even if the object of surface treatment is composed of an insulator. SOLUTION: The system is provided with an ion generation equipment 6 for generating ions and a pulse power source 8 for applying pulsative voltage to an insulator (material to be treated) 2. Ions generated by the ion generation equipment 6 are introduced into a vacuum chamber 3, where a plasma containing the ions to be injected is generated. By applying, within the plasma, the pulsative voltage containing positive pulse voltage and negative pulse voltage to the insulator from the pulse power source 8, the ions contained in the plasma are implanted into the insulator.
申请公布号 JP2001192826(A) 申请公布日期 2001.07.17
申请号 JP20000106841 申请日期 2000.04.07
申请人 SONY CORP 发明人 SOTOZAKI MINEHIRO;KOBAYASHI MASATO;UEDA MITSUNORI;OKITA HIROYUKI;MUKASA TOMOHARU
分类号 C23C14/48;G11B5/84;G11B7/135;G11B7/22;G11B7/24;G11B7/26;G11B11/105 主分类号 C23C14/48
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