| 摘要 |
PROBLEM TO BE SOLVED: To provide the seal for semiconductor-manufacturing apparatus, excellent in oxygen plasma-resistant characteristics, gas-permeability and sealing properties. SOLUTION: This seal for the semiconductor-manufacturing apparatus is characterized in that 40-150 pts.wt. barium sulfate is compounded with 100 pts.wt. vinylidene fluoride-hexafluoropropylene copolymer and/or vinylidene fluoride-hexafluoropropylene-tetrafluoroethylene copolymer while regulating the amount of inorganic materials except the barium sulfate so as to be <=1 pts.wt. to provide a composition, and the resultant composition is cross-linked by an organic peroxide. The seal for the semiconductor-manufacturing apparatus is also obtained by compounding 0.5-30 pts.wt. tetrafluoroethylene resin with the before composition.
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