发明名称 SEMICONDUCTOR PRODUCTION APPARATUS AND GAS EXHAUST METHOD IN SEMICONDUCTOR PRODUCTION APPARATUS
摘要 PROBLEM TO BE SOLVED: To put one cassette chamber in discharge state while preventing other cassette chambers from being shut in, in a semiconductor fabrication apparatus comprising a plurality of cassette chambers and a gas discharge pump used in common for discharging a gas out of the cassette chambers. SOLUTION: The semiconductor fabrication apparatus comprises a plurality of cassette chambers 2, 3 installed in a transportation chamber, treatment chambers 4, 5 installed in the transportation chamber, a transportation chamber gas discharge line 13 equipped with the gas discharge pump 20 installed in the transportation chamber, cassette chamber gas discharge lines 15, 17 connected to the cassette chambers, a gas discharge pump 26 to be used in common for at least two cassette chamber gas discharge lines, and connection lines 45, 47 connecting the cassette chamber gas discharge lines 45, 47 equipped with the common gas discharge pump to the transportation chamber gas discharge line.
申请公布号 JP2001190945(A) 申请公布日期 2001.07.17
申请号 JP20000004138 申请日期 2000.01.13
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 SAKATA NAOKO;TOMITA MASAYUKI;HAYASHIBARA HIDEMOTO;TAKAMI SATORU
分类号 H01L21/677;B01J3/02;F04B37/16;H01L21/68;(IPC1-7):B01J3/02 主分类号 H01L21/677
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