ALIGNMENT SYSTEM CAPABLE OF VISUAL INSPECTION

摘要

PURPOSE: An alignment system capable of a visual inspection is provided to save money necessary for purchasing an apparatus in a process for manufacturing a semiconductor, by simultaneously performing an alignment measurement and a visual inspection after a photolithography process while using one apparatus. CONSTITUTION: A scope(5) is used for a wafer alignment, an inspection of an identification and a read-only-memory(ROM) code of a wafer(40) and a defect inspection. An operation unit(50) generates a corresponding operation signal according to manipulation of a user. A control unit(60) generates a driving control signal according to the operation signal generated from the operation unit. A driving unit(70) generates a corresponding driving signal according to the driving control signal of the control unit. A stage(30) vertically and horizontally transfers the wafer according to the driving signal, mounted on the wafer.