APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE AND OPERATING METHOD THEREOF

摘要

PURPOSE: An apparatus for manufacturing a semiconductor device is provided to maintain a sealing state by using an O-ring even if the other O-ring is thermally damaged at a high temperature by installing two O-rings, and to embody a more effective sealing state by make a dual sealing unit vacuum through a dual-sealing gas exhausting pipe. CONSTITUTION: A reaction space isolated from the exterior is supplied to upper and lower process chambers flange-coupled to each other. A heater unit is installed in the reaction space. A vacuum pump is installed to make the inside of the process chamber vacuum. A chamber exhausting pipe connects the vacuum pump with the process chamber. The first and second O-rings(190a,190b) having different diameters are interposed between respective flanges installed in the upper and lower process chambers. One end of a dual-sealing gas exhausting pipe(170) is connected to a space between the first and second O-rings to make a space between the first and second O-rings vacuum. A water cooling pipe(200) is installed inside the flange of the lower process chamber to make water coolant flow.