SEMICONDUCTOR PROCESSING METHOD AND GATE STACK,申请号EP19990942555-传众专利搜索

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发明名称	SEMICONDUCTOR PROCESSING METHOD AND GATE STACK
摘要
申请公布号	EP1114444(A1)	申请公布日期	2001.07.11
申请号	EP19990942555	申请日期	1999.08.31
申请人	MICRON TECHNOLOGY, INC.	发明人	YIN, ZHIPING;IYER, RAVI;GLASS, THOMAS, R.;HOLSCHER, RICHARD;NIROOMAND, ARDAVAN;SOMERVILLE, LINDA, K.;SANDHU, GURTEJ, S.
分类号	H01L21/027;H01L21/28;H01L21/311;H01L21/318;H01L21/3205;H01L21/3213;H01L23/52;H01L29/423;H01L29/43;H01L29/49;H01L29/78;(IPC1-7):H01L21/027	主分类号	H01L21/027
代理机构		代理人
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