PLASMA PROCESS SYSTEM FOR PROCESSING HARMFUL GAS

摘要

PURPOSE: A plasma process system is provided to process a harmful gas effectively and economically with a low power consumption by increasing a decomposition efficiency, and to prevent the generation of second harmful gas like NOx. CONSTITUTION: A vacuum pump(4) is connected to the system to pull out a harmful gas from an apparatus(2) for fabricating a semiconductor, and the vacuum pump has a connection configuration to supply the exhaust gas to a reactor(6). A pulse generator(8) is connected electrically to the reactor, and makes a corona discharge occur between electrodes by applying a pulse to each electrode. And, a scrubber(10) is connected to purify the harmful gas processed in the reactor.